ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

What's New?

Thin-Film-Measurement-of-MEMS-and-Sensors-SENDURO-MEMS

SENTECH proudly presents the SENDURO®MEMS for fully automatic metrology quality control in sensor and MEMS production. The SENDURO®MEMS provides reliable and precise measurement of thin film stacks, using spectroscopic reflectometry and ellipsometry. The SENDURO®MEMS equipped with reflectometer is for fast thin film measurement. →read more

SENTECH-Seminar-on-Plasma-Etching-and-PECVD-2019

In good tradition SENTECH GmbH, Krailling hosted the SENTECH Seminar on Plasma Process Technology. The event took place on March 28, 2019. The seminar has become a meeting place for long-time users of SENTECH plasma tools and new customers.

40 experts of plasma process technology shared their experience in etching and coating with plasma systems and ALD systems. →read more

Upcoming Events:

Headbanner_SEMICON_Europa_2019

Quote-Button

SENTECH
Gesellschaft für Sensortechnik mbH

Konrad-Zuse-Bogen 13
82152 Krailling / KIM
Germany

Phone: +49 (0)89 - 89 79 60 70
Fax: +49 (0)89 - 89 79 60 722
Email: sales@sentech.de



Logo Sentech

SENTECH Instruments
Berlin, Germany

Logo_Freiberg_kurz

Freiberg Instruments
Freiberg, Germany