Spectroscopic Ellipsometry

Spectroscopic ellipsometers measure film thickness and refractive index of single layers, and multi‑layer stacks. Related properties of bulk materials, isotropic and anisotropic materials, surface and interface roughness as well as gradients can be analysed.


The new SENresearch 4.0 is designed for spectroscopic ellipsometry in the widest spectral range from 190 nm (deep UV) to 3,500 nm (NIR). Every SENresearch 4.0 is a customer-specific spectroscopic ellipsometry solution. The SENresearch 4.0 can be configured for full Mueller matrix, anisotropy, generalized ellipsometry, scatterometry measurement and more. Best measurement results are achieved using the Step Scan Analyser principle. Details for SENresearch 4.0 here!


The SENpro ellipsometer is the smart solution to spectroscopic ellipsometry applications. It features a goniometer with angles of incidence in 5 °-steps. Easy operation, rapid measurement, and intuitive data analysis are combined in a cost-effective design for measuring thickness and optical constants of single films and multilayer stacks. Details for SENpro here!


Vibrational spectroscopy is featured by the FTIR ellipsometer SENDIRA. Measuring the absorption bands of molecular vibrational modes in the infrared, the orientation of long molecule chains and the composition of thin films are analysed. Infrared spectroscopic ellipsometry is suited for measuring charge carrier concentration of conducting films. Details for SENDIRA here!

SENDURO®: Automated spectroscopic ellipsometry


Automated spectroscopic ellipsometry by SENDURO® comprises recipe based quick data analysis within a few seconds. The ellipsometer is designed for easy operation: Placing the sample, automatic sample alignment, automated measurement and analysis, result. Using spectroscopic ellipsometry in the automatic mode is perfectly suited for routine applications in quality control and R&D. Details for SENDURO® here!

2021_SENDURO MEMS Schiebetür 200x134-1

The SENDURO®MEMS provides reliable and precise measurement of thin film stacks, using spectroscopic reflectometry and ellipsometry. Wafers are loaded from standard cassettes and recipes carry out the quality control measurements. In Sensor and MEMS production, often, double-sided wafers are processed and backside protection is mandatory. The SENDURO®MEMS offers advanced edge grip technology for wafer backside protection. → Details for SENDURO®MEMS here!


The spectroscopic ellipsometry software SpectraRay/4 is designed focusing on an intuitive workflow. Therefore, SpectraRay/4 comprises a recipe mode with a two-step action (start measurement, result) and an interactive mode for step-by-step data analysis. The comprehensive package of SpectraRay/4 supports generalized ellipsometry, Mueller matrix formalism, scatterometry (3D profiler), anisotropy, and simulations. Details for SpectraRay/4 here!