ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

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SENTECH veranstaltet ein anwendungsorientiertes Seminar zum Thema „Ellipsometrie und Reflektometrie zur Qualitätskontrolle dünner Schichten“ in Berlin-Adlershof. Das Seminar ist ausgebucht, Anmeldungen können für die darauffolgende Veranstaltung vorgenommen werden. Auch in diesem Jahr werden kompetente Referenten  Ihnen an ausgewählten Beispielen die Anwendungsmöglichkeiten der optischen Messtechniken Ellipsometrie und Reflektometrie von SENTECH erläutern. →weiter

What's New?

Metrology for solar cells on large foils

SENTECH developed the new SenSol R2R measurement system for photovoltaics using large foil as substrate. Film thickness, optical as well as electrical properties of functional coatings can be measured on any position of the 2000 m long foils. For this purpose, transmission, reflection measurements and electrical metrology are applied. Challenging are flexibility and tension of the foil because they result in bulges and wrinkles.→read more

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SENTECH took part in the world’s largest photovoltaics exhibition “SNEC”, hold from May 28-30 in Shanghai, China. Information were given about the next generation of the SENperc PV, the well-known laser ellipsometer SE 400adv PV as well as on the measurement tool SenSol for large CIGS thin film solar cells.  →read more

Upcoming Events:

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SENTECH
Gesellschaft für Sensortechnik mbH

Konrad-Zuse-Bogen 13
82152 Krailling / KIM
Germany

Phone: +49 (0)89 - 89 79 60 70
Fax: +49 (0)89 - 89 79 60 722
Email: sales@sentech.de



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SENTECH Instruments
Berlin, Germany

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