ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

What's New?

Plasma-Seminar_2019_Teaser

SENTECH veranstaltet am 28.03.2019 ein anwendungsorientiertes Seminar über „Plasma Prozess Technologie“ in den Räumen von SENTECH Instruments in Berlin. Themen sind das schädigungsarme Ätzen und Beschichten in der Prozessierung von Bauelementen, 3D-konforme Abscheidung dünnster Schichten und industrielle Anwendungen in der Plasma Prozess Technologie. →read more

sentech_snec_china_2018

SENTECH took part in the world’s largest photovoltaics exhibition “SNEC”, hold from May 28-30 in Shanghai, China. Information were given about the next generation of the SENperc PV, the well-known laser ellipsometer SE 400adv PV as well as on the measurement tool SenSol for large CIGS thin film solar cells.  →read more

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